FIELD: microelectronics. SUBSTANCE: invention may find use in projection exposing systems for manufacture of semiconductor devices. Projection lens has twelve components and diaphragm. First one of them is negative double-cemented lens, second one - negative meniscus, third fourth, fifth and sixth ones - positive lenses, seventh one - cemented positive meniscus, eighth one - cemented negative meniscus facing plane of objects with convexity, ninth one - double-cemented meniscus, tenth one - positive lens eleventh one - biconcave lens, twelfth one - positive meniscus facing plane of objects with convexity. EFFECT: expanded application field, improved operational characteristics. 3 dwg, 1 tbl
Title | Year | Author | Number |
---|---|---|---|
PROJECTION 1/5@@@ MAGNIFICATION OBJECTIVE LENS | 0 |
|
SU1758624A1 |
1,5 MAGNIFICATION PROJECTION OBJECTIVE | 0 |
|
SU1659955A1 |
PROJECTION LENS | 1993 |
|
RU2075768C1 |
MULTILENS OPTICAL SYSTEM | 1993 |
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RU2047878C1 |
PROJECTION HIGH-APERTURE LENS | 2008 |
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RU2379721C1 |
PROJECTION OBJECTIVE LENS WITH 0,1 MAGNIFICATION | 0 |
|
SU800943A1 |
PROJECTION LENS GIVING 5X MAGNIFICATION | 0 |
|
SU1195319A1 |
PROECTION OBJECTIVE LENS WITH 1/4 MAGNETIFICATION | 0 |
|
SU605186A1 |
REPRODUCTION OBJECTIVE | 0 |
|
SU1818611A1 |
WIDE-ANGLE TV LENS | 0 |
|
SU1788493A1 |
Authors
Dates
1996-10-27—Published
1993-02-01—Filed