POLISHING PAD AND METHOD FOR PRODUCTION THEREOF, AS WELL AS A METHOD OF PRODUCING A POLISHED ARTICLE Russian patent published in 2020 - IPC B24B37/24 B24D3/28 H01L21/02 

Abstract RU 2736460 C2

FIELD: machine building.

SUBSTANCE: group of inventions relates to the production of a polishing pad used for grinding material that is hard to cut. Polishing pad comprises knitted fabric produced by warp knitting or weft knitting, and resin, impregnated with said knitted fabric. Polishing pad is characterized by a transverse cut along the surface of the knitted fabric, which acts as a polishing surface. Resin consists of a first resin and a second resin different from the first resin. Second resin is a reaction product of an urethane prepolymer containing an equivalent of NCO group equal to 450 or less, and a curing agent.

EFFECT: providing high polishing speed, higher quality of machined surface.

18 cl, 4 tbl, 1 dwg

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RU 2 736 460 C2

Authors

Tokushige, Shin

Nakase, Kejsuke

Kashivada, Khiroshi

Yamada, Tatsuya

Kojke, Kenichi

Narada, Josuke

Dates

2020-11-17Published

2017-05-29Filed