FIELD: X-ray examination. SUBSTANCE: microscope has a source of electrons, device for the electron beam focusing and deviation, thin film target a structure guiding X-radiation. And the system of detecting X-radiation (the new) feature in the microscope design is that the structure guiding X-radiation is made by consequent application of passing through and reflecting layers on the substrate and is located in the plane parallel to that of the target. EFFECT: simpler design. 4 dwg
| Title | Year | Author | Number |
|---|---|---|---|
| 0 |
|
SU1783593A1 | |
| SYSTEM FOR FORMATION OF MICROSTRUCTURE ON RESIST | 0 |
|
SU1798816A1 |
| SOURCE OF COLLIMATED X-RAY RADIATION | 0 |
|
SU1689818A1 |
| METHOD OF MEASURING THICKNESS OF THIN LAYERS APPLIED ON SUBSTRATE | 0 |
|
SU1298539A1 |
| PRISMATIC CORNER REFLECTOR | 1991 |
|
RU2101739C1 |
| PRISMATIC CORNER REFLECTOR | 1991 |
|
RU2101738C1 |
| CORNER REFLECTOR | 1991 |
|
RU2020668C1 |
| PRISMATIC REFLECTOR | 0 |
|
SU1712930A1 |
| CORNER REFLECTOR | 0 |
|
SU1742764A1 |
| POLARIZATION ARRANGEMENT FOR MEASURING TWIST ANGLES | 0 |
|
SU1825971A1 |
