PLASMA-ENHANCED COATING DEPOSITION METHOD Russian patent published in 1995 - IPC

Abstract RU 2029792 C1

FIELD: plasma-enhanced deposition. SUBSTANCE: method involves plasma-enhanced deposition of coating under water peripherally of nozzle or nozzle head; ejecting ambient water in an amount of 1-10 g/sec. EFFECT: increased efficiency and high quality of coating. 2 tbl

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RU 2 029 792 C1

Authors

Verstak Andrej Aleksandrovich[By]

Sobolevskij Sergej Borisovich[By]

Okovityj Vjacheslav Aleksandrovich[By]

Dates

1995-02-27Published

1992-01-22Filed