METHOD FOR DEPOSITION OF RHENIUM ON METAL BASE Russian patent published in 1995 - IPC

Abstract RU 2049826 C1

FIELD: deposition of rhenium on metal base. SUBSTANCE: process is conducted by chemical reduction on aluminum base from solution with the following qualitative and quantitative composition, g/l: sodium hydroxide 34-45; sodium thiocyanate 180-200; aluminum sulfate 35-45; trilon B 80-100; hydrazine sulfate 35-45; hydroxylamine 45-50; sodium perrhenate 20-25; hydrogen peroxide 25 ml/l; acetone 50 ml/l; the balance for one liter, concentrated solution of ammonium hydroxide. Process is conducted at room temperature and prior to reduction, aluminum surface is degreased, pickled and activated. EFFECT: higher efficiency. 3 cl, 1 tbl

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RU 2 049 826 C1

Authors

Sinjakova Galina Stepanovna[Lv]

Korotkova Irina Petrovna[Ru]

Dates

1995-12-10Published

1993-02-08Filed