FIELD: light industry. SUBSTANCE: method involves inscribing planar mappings of three- dimensional parts of back and strip into rectangular coordinate grid, with mappings being made in the form of part pattern contours with grid applied on them and obtained from dummy basic surface enclosure; correcting static and dynamic correspondence zones, with allowances being taken into account; obtaining new contour of pattern by corrected parameters of pattern. Developments of the whole surface of dummy up to thigh line used as mappings are obtained from three-dimensional surface of dummy, provided that lengths of cuts on development surface in vertical and horizontal planes are equal to that of three-dimensional surface. Prior to effectuating zone correction, allowance norm is calculated by formula N=p/l, where N is allowance norm for given level (of line), p is allowance for given level (of line), l is total line length , obtained by adding lengths of portions at given development level and equal to , where n is number of developments (portions) in vertical or horizontal planes, defined by disintegration lines, l li is length of each portion of development. Pattern size is calculated at each level by formula Li=li(1+N), where L Li is pattern size. EFFECT: increased efficiency of method. dwg, 1 tbl
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Authors
Dates
1996-04-10—Published
1993-01-05—Filed