FIELD: production of inorganic compounds. SUBSTANCE: aluminium(III) fluoride is charged onto the surface of molten aluminium metal and, as the former is dipping, its reaction with aluminium occurs resulting in formation of volatile aluminium(I) fluoride. The latter reacts in gaseous phase with nitrogen-containing gas to yield aluminium nitride followed by isolation thereof from gaseous phase. Resultant product is destined to be used in manufacture of radioelectronic components. EFFECT: increased capacity of main equipment. 2 cl, 1 tbl
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Authors
Dates
1997-02-27—Published
1995-05-30—Filed