FIELD: refrigerating engineering. SUBSTANCE: absorption-diffusion unit includes thermosiphon whose lower portion is brought in communication with absorbent tank partially filled with liquid solution and upper portion is brought in communication with weak solution chamber which is connected in its turn with absorber inlet by means of main, thermal power source and evaporator connected at inlet with vapor volume of tank by means of pipe line. Outlet of weak solution main is located above absorber inlet. Thermal power source may be located on thermosiphon or on weak solution chamber. Thermosiphon may be located in inner weak solution chamber and thermal power source is located on outer surface of weak solution chamber. Outlet section of thermosiphon may be located below absorber inlet and above outlet section of weak solution main; upper portion of weak solution chamber has restricted passage area. Upper portion of weak solution main may be mounted in zone of thermal contact with evaporator and with pipe line discharging vapor-and-gas mixture from evaporator. Section of weak solution main between zone of thermal contact with evaporator and absorber inlet and starting section of absorber may be coated with heat-insulation. Evaporation of weak solution is effected when level of weak solution is above the level of absorber inlet at increased pressure in zone of thermal power supply. EFFECT: enhanced efficiency. 11 cl, 3 dwg
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Authors
Dates
1997-08-27—Published
1992-12-08—Filed