FIELD: optical-mechanical and electronic industry. SUBSTANCE: etching liquor is used for removing thin-layer coatings of germanium-silicon monooxide from the surface of indium and gallium arsenides. Composition has ammonium bifluoride, water, chrome (III) nitrate and dimethylformamide at the following ratio of components, wt. -%: ammonium bifluoride 12-16; chrome (III) nitrate 12-16; organic solvent 6-10, and water - the rest. EFFECT: high quality of surface, increased rate of process. 2 cl, 2 tbl, 6 ex
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Authors
Dates
1998-09-27—Published
1997-03-12—Filed