FIELD: corrosion protection. SUBSTANCE: invention relates to manufacturing thin-film coatings, in particular, to vacuum deposition of low-emission transparent coatings onto transparent materials such as glass or polymer films involving constant-current reactive magnetron sputtering technics. Coating contains transparent base and at least three layers arranged in the following order: dielectric, metal, dielectric. Dielectric layers 10-60 nm thick are obtained in argon-nitrogen atmosphere and made from aluminum nitride alloy containing 0.5-0.7 wt.% of impurities (among them 0.25-0.3% iron and 0.25-0.3% silicon), current density on alloy target being 20 mA/sq.cm, distance between base and target 70-90 mm, and summary argon-nitrogen pressure not exceeding 5•10-4 mm Hg. Metal layer 7-20 nm thick consists of silver or copper. EFFECT: simplified applying coating on surface and increased chemical resistance to atmosphere effects. 2 cl, 1 tbl
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Authors
Dates
1999-06-27—Published
1998-10-05—Filed