METHOD OF PLOTTING PATTERN FOR JACKET-TYPE COLLAR Russian patent published in 2002 - IPC

FIELD: light industry. SUBSTANCE: method involves aligning upper outlines of strip and back parts along shoulder cuts; applying all lapel and collar model lines; drawing perpendicular lines through point of intersection of shoulder cut and model flap line to lapel fold line dividing collar pattern into front and rear parts; symmetrically mapping contours of collar rear part relative to straight line extending parallel to lapel folding line through line of intersection of throat line and dividing line; symmetrically mapping contours of front collar part relative to lapel folding line; plotting auxiliary pattern of collar in flat state; transforming collar by means of patch-linear approximation of throat line into design pattern, with length of collar flap model line being taken into account; plotting width of auxiliary pattern above shoulder seam at normal line from throat peak part. Method allows precise collar design to be obtained without necessity of fitting sample for providing precise collar width and flap length. EFFECT: simplified method and provision for producing precise collar pattern. 5 dwg