METHOD FOR PRODUCING THIN-LAYER MOLECULAR SIEVES Russian patent published in 2002 - IPC

Abstract RU 2183499 C2

FIELD: molecular sieve structures on substrates. SUBSTANCE: method is used to apply thin layers of molecular sieves onto surfaces of various substrates. It is characterized in that microcrystals of proposed molecular sieves are bonded during first phase with substrate surface to form single layer and during second phase they are allowed to grow to form thin solid and dense layer, 100 nm thick and even thinner. Such thin layers of molecular sieves are useful for producing membranes, catalysts, sensors, and reinforcing fillers for polymers. EFFECT: enhanced efficiency. 10 cl, 3 dwg, 12 ex

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RU 2 183 499 C2

Authors

Khedlund Jonas

Shoeman Brian

Sterte Per Jokhan

Dates

2002-06-20Published

1997-03-13Filed