FIELD: cellulose materials. SUBSTANCE: composition for manufacturing films contains 8-10% cellulose triacetate with acetyl number 61.8, 0.15-0.50% organosilicon block copolymer, in which ratio of arylate and siloxanes motifs in blocks is 20:200, and to 100% organic solvent. Number of breaks in thus prepared macromolecules after UF radiation decreases by several times. EFFECT: increased light resistance of films and improved their consumer's characteristics. 1 tbl, 12 ex
