GEAR USED IN STENCIL PROCESS AND METHOD OF ALIGNMENT OF TREATED SUBSTRATE AND MASK Russian patent published in 2002 - IPC

FIELD: electrical engineering, manufacture of printed circuits on substrates. SUBSTANCE: proposed gear used in stencil process includes coordinate table, bed frame, visual control unit, fixture to anchor substrate on coordinate table and fixture to anchor gauze mask. Salient feature of gear lies in mounting of coordinate table on bed frame. Supporting device is made fast to coordinate table. Visual control unit is put on supporting device so positioned that visual control unit views main portion of surface of coordinate table. Gear is supplemented with facility for relative displacement between coordinate table and fixture to anchor gauze mask. Visual control unit is mounted for observation of alignment marks applied on substrate so that visual control unit can observe alignment marks applied to gauze mask when gauze mask is located between visual control unit and substrate. By this approach alignment of relative positions of gauze mask and substrate comes easier. Method of alignment of marks applied to treated substrate and gauze mask realized with the aid of above-mentioned gear is also described in formula of invention. EFFECT: increased efficiency and precision of alignment of gauze mask and treated substrate. 8 cl, 2 dwg