GAS-DISCHARGE CHAMBER Russian patent published in 2004 - IPC

FIELD: gas-discharge engineering; glow discharge production for various applications.

SUBSTANCE: gas-discharge chamber designed to produce glow discharge for exciting active media of gas lasers, spectroscopy of gases and their mixtures for chemical analysis, developing plasma chemical reactors, and plants for plasma etching of integrated circuits, and for other purposes is essentially hermetically sealed gas-filled cavity whose walls are made in the form of metal electrodes isolated from adjacent electrodes by means of insulating gaskets. Chamber is made in the form of convex polyhedron such as regular octahedron, cubic octahedron, icosahedral decahedron, rhombic-cubic octahedron, truncated tetrahedron, truncated icosahedron, or truncated dodecahedron whose edges carry insulators. In addition polyhedron may be made in the form of combination of two pyramids with equal even number of side edges and with equal open bases joined together at outlines of their bases so that apexes of pyramids occur at different ends of base plane; polyhedron can be also made in the form of combination of two pyramids and at least one prism with equal even number of side faces and with similar open bases joined together at outlines of their bases in pyramid-prism-pyramid sequence so that apexes of pyramids occur at different ends of prisms.

EFFECT: ability of spherical focusing negative-glow prism causing enhanced specific luminosity at same contribution to glow discharge.

11 cl, 10 dwg