FIELD: polygraphic technologies, methods for manufacturing polygraphic elements related to category of elements providing protection of polygraphic production from forgery.
SUBSTANCE: method for creating a concealed image within counter-forgery protective elements of polygraphic products includes, for special protective element consisting of multiple intersecting lines, forming an offset for a portion of bitmap lines utilized to make ornament of aforementioned protective element, for half the step of bitmap line step. For aforementioned special protective element firstly two even bitmap fields are formed, created by means of linear bitmap with similar line positioning and relative area of bitmap elements in first bitmap field 60-70% and in second bitmap field 15-20% and coinciding in size with special protective element with displayed dark portions of ornament on first bitmap field and light portions of ornament on second bitmap field. Onto aforementioned bitmap fields image in form of label and/or drawing is applied, positioned evenly relatively to boundaries of aforementioned fields, which is then cut out, and formed special space is filled with same bitmap with offset for half step of bitmap lines, basic special protective element is repainted for forming of special protective mask, wherein white elements remain white while dark elements become transparent, then special protective mask is positioned on first bitmap field and second bitmap field on special protective mask for producing a model of special protective element with concealed image.
EFFECT: improved level of protection of polygraphic products from forgery, possible direct trustworthiness check due to utilization of individual template.
2 cl, 11 dwg
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Authors
Dates
2006-03-20—Published
2004-08-26—Filed