METHOD FOR FORMATION OF POLYHEDRAL OLIGOMER SILSESQUIOXANES Russian patent published in 2007 - IPC C08G77/44 C07F7/21 

FIELD: synthesis of organosilicon compounds.

SUBSTANCE: invention proposes method for direct preparation of polyhedral oligomer silsesquioxanes, wherein action of bases is used, said bases being capable of affecting silicon or any compound, which can interact with a solvent, such as ROH, H₂O and the like, and forms hydroxide [OH^-], alkoxide [RO^-] and the like. First method involves such bases for effective redistribution of silicon-oxygen framework in polymeric silsesquioxanes [RSiO_1,5]α, in which α ranges from 1 to 1000000 or higher, in polyhedral oligomer silsesquioxanes having nanostructure of formula [(RSiO_1,5)_n]Σ#, homoleptic, [(RXSiO_1,0)_n]Σ#, functionalized homoleptic nanostructures. Second method utilizes bases to assist formation of polyhedral oligomer silsesquioxanes nanostructures of formulas: [(RSiO_1,5)_n Σ#, homoleptic, and [(RSiO_1,5)_m[(R'SiO_1,5)_n]Σ#, heteroleptic, and [(RSiO_1,5)_m[(RXSiO_1,5)_n]Σ#, functionalized heteroleptic nanostructures from silanes RSiX₃ and linear or cyclic silsesquioxanes of formula RX₂Si-(OSiRX)_m-OSiRX₂, wherein m=0-10, X=OH, Cl, Br, I, alkoxy OR, acetate OOCR, peroxide OOR, amine NR₂, isocyanate NCO, and R. Third method utilizes bases to selectively open silicon-oxygen-silicon bonds (Si-O-Si) in polyhedral oligomer silsesquioxane structures to form types of polyhedral oligomer silsesquioxanes with not fully condensed nanostructures. All three methods provide novel types of polyhedral oligomer silsesquioxanes, which can be further chemically treated to convert into polyhedral oligomer silsesquioxane particles suitable for polymerization, grafting, or other desired chemical reactions.

EFFECT: expanded synthetic possibilities in organosilicon compound preparation area.

55 cl, 10 dwg, 3 ex