FIELD: electricity.
SUBSTANCE: creation of multilayer supporting electrode with derivative-porous structure and subsequent application of gas-proof thin-film electrolyte layer is carried out in the following manner. Creation of electrode layer with minor volume porosity and pore size is carried out by melting surface electrode layer with electron beam to depth of 1-1.5 micron, and gas-proof thin-film electrolyte application is carried out using magnetron sputtering method. Before melting surface electrode layer with electron beam, this layer is covered with electrolyte film using magnetron sputtering method. Melting of surface layer is carried out with electron beam having following parametres: beam energy density is 0.8÷3 J/cm2, pulse number is 1÷6.
EFFECT: decrease in porosity and pore size of support electrode surface layer.
3 cl, 6 dwg, 1 tbl, 2 ex
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