WATER DISPERSION FOR PROTECTION OF PLANTS, NANOPARTICLE COMPOSITION FOR PROTECTION OF PLANTS, AGROCHEMICAL COMPOSITION AND METHOD OF ITS PRODUCTION, METHOD TO RESIST UNDESIRABLE GROWTH OF PLANTS AND/OR UNDESIRABLE DAMAGE OF PLANTS FROM INSECTS OR MITES AND/OR TO RESIST PHYTOPATHOGENIC FUNGI (VERSIONS) Russian patent published in 2010 - IPC A01N47/34 A01N43/653 A01N25/28 A01N53/00 A01N47/24 A01N43/40 A01N25/04 A01P3/00 A01P7/00 A01P13/00 

Abstract RU 2407288 C2

FIELD: agriculture.

SUBSTANCE: water dispersion for protection of plants includes nanoparticle composition of reactant for plant protection, where nanoparticles have structure of nucleus-shell with average diametre of particles from 0.05 to 2.0 mcm; reactant for plant protection is radiologically amorphous, is in nucleus with one or more polymers, which are insoluble or partially soluble in water or water solutions, or mixtures of water with dissolvent, i.e. the second virial coefficient may not be below zero; - shell consists of stabilising wrapping matrix, containing interphase or surfactant polymer colloids, or low-molecular amphiphilic compounds or their mixtures. Nanoparticles are produced by making a reactant solution to protect plants in organic dissolvent, which is not mixed with water, by dissolving of nucleus polymer in organic dissolvent, which is not mixed with water and emulsification of mixture from (a) and (b) with water solution, containing components of wrapping matrix, by means of injection of according solutions in mixing chamber. After emulsification organic dissolvent is removed. Solid nanoparticle composition is produced by drying of water dispersion. Agrochemical composition contains solid carrier treated with specified water dispersion or solid nanoparticle composition. Seed material is etched with specified water dispersion or treated with solid composition. Undesirable fungi, plants or insects are treated with specified dispersion or composition.

EFFECT: invention allows increasing composition stability.

13 cl, 4 ex

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RU 2 407 288 C2

Authors

Martin Ingrid

Auveter Khel'Mut

Kol'Ttsenburg Zebastian

Shehfer Ansgar

Pfljuger Peter

Blants Birgit

Gedel' Verner A.

Dates

2010-12-27Published

2006-10-17Filed