REACTOR FOR EPITAXIAL GROWTH OF HYDRIDES IN VAPOR PHASE Russian patent published in 2013 - IPC C23C16/44 

FIELD: machine building.

SUBSTANCE: reactor comprises reaction chamber with inlet for feeding process gases therein and outlet for discharge of residual gases, and pump to force residual gases from reaction chamber via said outlet. Said pump produces and maintains pressure in reaction chamber equal to or lower than approx. 10 kPa (100 mbar). Besides, reactor comprises appliances to feed liquid diluents into pump to dilute harmful substances precipitated from residual gases on pump inner surfaces. Said appliances are composed of container for diluents communicated with pump delivery and discharge openings to make closed circuit for diluent circulation.

EFFECT: continuous operation.

2 cl, 1 dwg