FIELD: physics, control.
SUBSTANCE: group of inventions relates to process field devices. Disclosed is a process field device for use in monitoring or controlling an industrial process, which includes first and second loop terminals configured to connect with a double-wire control loop of the industrial process. The field device circuitry is designed to monitor or control a parameter of the industrial process. The field device circuitry is powered from the double-wire control loop of the industrial process. A current regulator is connected in series to the double-wire control loop of the industrial process, the first and second loop terminals and the field device circuitry. A voltage regulator is connected in parallel to the current regulator and in series to the double-wire control loop of the industrial process, the first and second loop terminals and the field device circuitry.
EFFECT: higher power available for process field device circuitry.
18 cl, 7 dwg
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Authors
Dates
2014-10-10—Published
2011-05-09—Filed