COPOLYMERS FOR COMPOSITIONS SENSITIVE IN NEAR INFRARED REGION OF RADIATION FOR COVERING POSITIVE THERMAL LITHOGRAPHIC PRINTING FORMS Russian patent published in 2015 - IPC C08F220/10 C08F220/36 C08F220/38 C08F220/54 C08F212/02 

Abstract RU 2559050 C2

FIELD: chemistry.

SUBSTANCE: claimed invention relates to thermal lithographic printing forms and their coatings. Described is polymer, which has general formula, presented below, where a, b, c and d are molar ratios, varying between approximately 0.01 and approximately 0.90; A1 represents monomer units, containing cyano-containing suspended group, in which cyano is not bound directly to main copolymer chain; A2 contains suspended group, containing 5,5-dialkylhydantoin group, aminosulphonamide group or hydroxygroup; A3 contains alkyl or aryl suspended group, aryl is eventually substituted alkyl; and A4 contains suspended group, containing group of carboxylic acid. Formula .

EFFECT: provision of high rate of laser image formation, high resolution image, wide processing possibilities, stable storage term, good resistance to impact of chemical substances and long run on printing machine.

10 cl, 21 ex, 1 tbl

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RU 2 559 050 C2

Authors

Ngujen Mi T.

Pkhan Akkha

Ngujen-Truong V'Et-Tkhu

Loka Mark-Andre

Dates

2015-08-10Published

2010-09-14Filed