MICRORELIEF STRUCTURE, Russian patent published in 2015 - IPC B42D25/30 

Abstract RU 2566928 C2

FIELD: process engineering.

SUBSTANCE: invention discloses making of relief pattern as a part of laminar structure. Claimed process comprises making the relief pattern on the surface of ply of said structure. Thereafter, protective locking ply is produced in selected areas of said relief pattern. Said protective ply doubles as an underlying relief pattern protector during subsequent structure processing whereat relief is eliminated in areas without said protector ply.

EFFECT: relief pattern as the part of laminar structure.

44 cl, 8 dwg

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RU 2 566 928 C2

Authors

Ermolaev Igor

Kotachka Libor

Tetal' Tomash

Dvorak Robert

Dates

2015-10-27Published

2010-02-08Filed