DEVICE FOR FLUID FLOW CONTROL, DEVICE FOR FLOW CONTROL AND CHANNEL-DEPENDENT SYSTEM FOR RESISTANCE CONTROL Russian patent published in 2016 - IPC E21B43/12 

FIELD: machine building.

SUBSTANCE: group of inventions relates to devices for selective control of a fluid flow from the place of its formation in a hydrocarbon-containing underground reservoir to a flow string in a borehole and, namely, to devices for fluid flow control based on some characteristics of the fluid flow using a fluid flow control system and a channel resistance system serving for the creation of alternating resistance for the fluid flow. The fluid flow control device comprises a system to regulate the ratio of flow rates in a multichannel flow. This system consists of at least the first through channel and the second through channel. The ratio of the flow rates via the first through channel and the second through channel is concerned with the parameter of the fluid flow. It is provided for the change of the flow rate ratio at these two through channels as far as the fluid flow parameters change. The efficiency of the system to regulate the flow rate ratio in the multichannel flow is used to control the channel-dependent resistance control system including a vortex unit. The above unit comprises the first and the second inlet channels and a vortex chamber. The first inlet channel of the vortex unit is communicated with the first through channel of the system to regulate the flow rate ratio in the multichannel flow. The second inlet channel of the vortex unit is communicated with the second through channel of the system to regulate the flow rate ratio in the multichannel flow. Herewith the first inlet channel of the vortex unit can guide the fluid to the vortex chamber mainly in the tangential direction. The second inlet channel of the vortex unit can guide the fluid to the vortex chamber mainly in the radial direction.

EFFECT: improved device for fluid flow control.

194 cl, 33 dwg