FIELD: chemistry.
SUBSTANCE: method of producing a mirror comprises preparing of a wafer, depositing a multilayer thin-film coating on a wafer, including following in order of movement from the wafer: the first silicon-containing layer, a metal layer comprising aluminum, the second silicon-containing layer, and applying of a protective paint using liquid method directly on top and in a direct contact with the remotest layer of a multilayer thin-film coating. The protective paint is applied so that its density after curing amounts 5-100 grams per square meter, and protective paint curing is carried out. After the mentioned curing the protective paint is capable of withstanding 85°C temperature affect for seven days at 85% of relative humidity and withstanding 49°C temperature for seven days at 100% of relative humidity.
EFFECT: high resistance to temperature.
25 cl, 10 dwg
