FIELD: construction.
SUBSTANCE: method of processing an electrochromic device (ECD) is proposed. It includes the following operations. Removing said ECD from the substrate edge area by means of electromagnetic radiation, wherein said edge area width is from about 1 mm to about 20 mm. Wherein the ECD is tinted up to the edge along the ECD perimeter. Sealing the edge along the perimeter of said ECD between the distance frame and the glass unit substrate with the sealing compound layer. The electrochromic device coating on the transparent substrate embedded in the glass unit is proposed as well. Wherein the electrochromic device coating has the scrapped edge and the open bus contact surface and the insulating lines of scribing. Wherein the electrochromic device coating is tinted up to its edge along the perimeter. The method for producing an electrochromic device (ECD) is proposed as well. It comprises the following steps. Applying said ECD to the substrate without the ECD marking or using only one almost straight scribing line to mark said ECD. Scraping the edges along the substrate perimeter, wherein the width of the removed edge perimeter area of said ECD is from about 5 mm to about 15 mm. Removing a portion of said ECD along one edge to form the open contact bus surface to expose the lower conductive layer. The glass unit comprising the above-described electrochromic device is proposed as well.
EFFECT: improved method.
43 cl, 25 dwg
