CONTROLLED PRESSURE RAISING SYSTEM OF LOW-PRESSURE GAS Russian patent published in 2020 - IPC F17D1/07 

Abstract RU 2714589 C1

FIELD: transport of substances.

SUBSTANCE: invention relates to movement of fluids via pipelines, namely to low pressure gas transportation system, and can be used if it is necessary to change dynamic and flow characteristics of moved fluid, preferably, at change of flow rate and pressure of moved gas in pipeline. Proposed system comprises at least two parallel installed ejectors with different capacity, each of which is made with possibility of changing nozzle and mixing chamber. Active fluid bypass line control valve is installed parallel to ejectors, low-pressure gas line is connected to ejectors inputs by means of flange connections, as well as through shutoff valves and angular bends to ejectors inputs high-pressure medium line is connected, which is also connected through shutoff valve to inlet of said control valve, outputs of ejectors and said control valve through shutoff valves are connected to mix discharge main line.

EFFECT: technical result achieved when implementing the developed technical solution consists in enabling deep control of system operation both by active gas flow rates and pressures with simultaneous facilitation of system readjustment.

12 cl, 1 dwg

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RU 2 714 589 C1

Authors

Belyaev Andrej Yurevich

Dates

2020-02-18Published

2019-06-06Filed