FIELD: chemistry.
SUBSTANCE: present invention relates to a composition containing organic material subjected to oxidative, thermal or light-induced destruction. Described is a composition for protecting an organic material subjected to oxidative, thermal or light-induced degradation, which comprises a) an organic material, subject to oxidative, thermal or light-induced destruction, and b) a compound of formula I-P, I-O or I-M:
,
where YP, YO and YM are oxygen or represent a covalent bond; when YP, YO and YM are oxygen, R1P is one of the subformulas II-P, II-O or II-M:
R1O is one of the subformulas II-O or II-M, R1M is subformula II-M, or R1P together with R2P, R1O together with R2O and R1M together with R2M represent one of subformulas III, IV or V:
R1P, R1O and R1M represent C6-C10-aryl, which is unsubstituted or substituted C1-C8-alkyl, C1-C8-alkoxy, halogen or one phenyl, C1-C18-alkyl, C3-C16-cycloalkyl, C7-C13-aralkyl, C2-C18-alkenyl, C2-C30-alkyl, which is interrupted by one or more oxygen atoms, or C2-C16-alkyl, which is interrupted by one sulfur atom, R2P is one of subformulas II-P, II-O or II-M, R2O is one of the subformulas II-O or II-M, R2M is a sub-formula II-M, or R2P together with R1P, R2O together with R1O and R2M together with R1M represent one of the sub-formulas III, IV or V, or R2P, R2O and R2M are C6-C10-aryl, which is unsubstituted or substituted with C1-C8-alkyl, C1-C8-alkoxy, halogen or one phenyl, C1-C18-alkyl, C3-C16-cycloalkyl, C7-C13-aralkyl, C2-C18-alkenyl, C2-C30-alkyl, which is interrupted by one or more oxygen atoms, or C2-C16-alkyl, which is interrupted by one sulfur atom; when YP, YO and YM are a covalent bond, R1P is one of the subformulas II-P, II-O or II-M, R1O is one of the subformulas II-O or II-M, R1M is a sub-formula II-M, or R1P, R1O and R1M are C6-C10-aryl, which is unsubstituted or substituted with C1-C8-alkyl, C1-C8-alkoxy, halogen or one phenyl, C1-C18-alkyl, C3-C16-cycloalkyl, C7-C13-aralkyl, C2-C18-alkenyl, C2-C30-alkyl, which is interrupted by one or more oxygen atoms, or C2-C16-alkyl, which is interrupted by one sulfur atom, R2P, R2O and R2M are C6-C10-aryl, which is unsubstituted or substituted with C1-C8-alkyl, C1-C8-alkoxy, halogen or one phenyl; R4, R5, R6 and R7 independently represent hydrogen or C1-C8-alkyl, RP2, RP3, RP5 and RP6 independently of each other represent hydrogen or C1-C8-alkyl, RO1, RO2, RO5 and RO6 independently represent hydrogen or C1-C8-alkyl, RM1, RM3, RM5 and RM6 independently represent hydrogen or C1-C8-alkyl, Ra1, Ra2, Ra3 and Ra4 independently represent hydrogen or C1-C8-alkyl, Rb1, Rb2, Rb3, Rb4, Rb5 and Rb6 independently represent hydrogen or C1-C8-alkyl and Rc1, Rc2, Rc3 and Rc4 independently represent hydrogen or C1-C8-alkyl. Also disclosed is a method of protecting organic material subjected to oxidative, thermal or induced destruction light, use of a compound of formula I-P, I-O or I-M, a compound of formula I-P, I-O or I-M, a filler composition for protecting organic material.
EFFECT: higher stability to hydrolysis in wet conditions of material against destruction under action of heat, light or oxidation.
21 cl, 5 tbl
