FIELD: analytic chemistry. SUBSTANCE: sample of organosilicon or organometallic compound is decomposed with the help of steams of nitric, hydrochloric and hydrofluoric acids. The process is carried out within 1-1.5 h at 180-200 C in the presence of trityl chloride, concentration of nitric and hydrochloric acid being 80-100 mg/cm3 and 150-200 mg/cm3 respectively. EFFECT: increases accuracy of the method, decreases its duration and detection limit.
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Authors
Dates
1995-05-27—Published
1987-06-04—Filed