PHOTOPOLYMERIZING COMPOSITION FOR PREPARING OF MATRIX PROTECTIVE RELIEF FOR GALVANOPLASTIC ACCUMULATING Russian patent published in 1994 - IPC

Abstract SU 1632228 A1

FIELD: photography. SUBSTANCE: composition has the following ratio of components, wt. -% : copolymer 15-36; dimethacrylate triethylene glycol 25-33; benzoin isobutyl ester 1.0-1.5; 3,5-di-tert. -butyl-benzoquinone-1,2 0.02-0.05, and ethanol - the rest. The source of copolymer: copolymer of methacrylic acid with methylmethacrylate or butylmethacrylate (content of links is 20-25 wt. -% and 80-75 wt. -% , respectively), mol. mass is 45000-99000, composition heterogeneity is 5% . For relief of visual control composition has a dye rhodamine 6Ж (0.14-0.52 wt. -% ). Use of proposed composition ensures to increase the resolution at the thickness of layers 20-45 microns at rectangular contour interval of relief. EFFECT: enhanced resolution of photoresist layers. 2 cl, 1 tbl

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SU 1 632 228 A1

Authors

Treushnikov V.M.

Esin S.A.

Zueva T.A.

Kalashnikov B.P.

Olejnik A.V.

Knjazeva T.E.

Semchikov Ju.D.

Modeva Sh.I.

Taranets V.P.

Shul'Pin G.P.

Dates

1994-04-30Published

1988-10-06Filed