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2 039 776

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C1

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IPC

(21) (22)

Application

93050792/05, 1993-11-15

(22)

Actual filing date

1993-11-15

(45)

Published

1995-07-20

(72)

Inventor

Frolov A.V.Sukhanov A.E.Romanovtseva T.N.Chistov A.A.Bogomazova T.E.Azarko G.A.Stepanov A.L.Burjak V.I.

(73)

Holder

Tovarishchestvo S Ogranichennoj Otvetstvennost'Ju

COMPOSITION FOR POLISHING Russian patent published in 1995 - IPC

Abstract RU 2039776 C1

FIELD: optical and mechanical industry. SUBSTANCE: the composition for polishing comprises (wt): 0.06-0.024 methyl methacrylate- methacrylic acid copolymer having a molecular weight of 5·105-1,5·106; 0.02-0.06 zinc chloride; 3-30 with a weight proportion of an amorphous phase of at least 60% 0.002- 0.008 potassium hydroxide; and water, the balance. The composition produces a high polishing effect has low manufacturing cost and is ecologically pure. EFFECT: improved properties of the composition. 1 tbl

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RU 2 039 776 C1

Authors

Frolov A.V.

Sukhanov A.E.

Romanovtseva T.N.

Chistov A.A.

Bogomazova T.E.

Azarko G.A.

Stepanov A.L.

Burjak V.I.

Dates

1995-07-20—Published

1993-11-15—Filed

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