FIELD: inorganic chemistry. SUBSTANCE: method involves interaction of arsenic trihalide with silicon-elementorganic compound (hydrodisiloxanes) in liquid phase at 10-70 C followed by isolation and sublimation of solid reaction product under vacuum. Prepared arsenic of high purity satisfies requirements for parental materials used in electronic engineering. Impurity content before sublimation is 10-4-10-5% and after sublimation is 10-6-10-7%, yield is up to 95% (as As). EFFECT: improved method of arsenic producing. 3 cl, 1 tbl
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Authors
Dates
1995-12-20—Published
1991-10-04—Filed