PLASMA SOURCE OF NEGATIVE ATOMIC IONS Russian patent published in 1997 - IPC

FIELD: ion engineering. SUBSTANCE: plasma source has sealed electrical-discharge chamber with inlet and outlet holes. electrodes connected to power supplies, main ones being placed in chamber and accelerating electrode, behind its outlet hole. Chamber internal wall of length L is conducting in discharged region and is connected to power supply; pulsed power supplies are used for main and accelerating electrodes and for conducting surface; outlet hole is located in conducting wall and length L of conducting surface is found from condition L >2D, L<I, where D is width of electrical discharge chamber; I is length of discharge region. EFFECT: provision for obtaining electron-free pulsed beams of negative atomic ions directly at plasma source outlet. 2 dwg