POLISH COMPOSITION FOR CHEMICAL-MECHANICAL POLISHING Russian patent published in 1997 - IPC

Abstract RU 2082738 C1

FIELD: polish compositions. SUBSTANCE: aqueous-organic base has additionally 0.1-15% of diamond ultradispersed particles at microcrystal size 2-20 nm, density of surface adsorption-active centers of acid nature 1-20 mcg-equiv./mg and electrolytes at amount 1-20% of the base mass. Composition is used for material working in electronic, laser and optical technique. EFFECT: enhanced effectiveness, improved quality of surfaces to be worked. 2 cl, 2 tbl

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RU 2 082 738 C1

Authors

Gubarevich Tat'Jana Mikhajlovna

Dolmatov Valerij Jur'Evich

Dates

1997-06-27Published

1993-05-26Filed