FIELD: holography. SUBSTANCE: in agreement with first version marker pressing is manufactured with the aid if matrix which pressing surface in the form of foil is made of nickel with holographic microrelief. Article is heated in advance and held at temperature higher than recrystallization temperature of metal but lower than melting one. After this article is stamped with application of pressing force of stepped character to surface of matrix. In this case step of growth of stress of plastic deformation of material of article alternates with step of drop of stress. In compliance with the second version layer of photoresist is deposited on metal surface, its optical modulation is conducted as well as chemical milling in process of which soluble sections of it are removed. After this layer of photoresists acquires appearance of microrelief structure in the form of ridges and furrows. Then metal surfaces on sections from which photoresist is removed are subjected to ion-beam etching in vacuum with apron. EFFECT: enhanced efficiency. 7 cl
