METHOD OF FORMING MICRORELIEF OF ARTICLE SURFACES Russian patent published in 2005 - IPC

Abstract RU 2248266 C2

FIELD: electronic engineering.

SUBSTANCE: method comprises processing the blank surface with the concentrated radiation flux. The radiation flux is directed to the surface to be processed and repeatedly moves over the surface thus forming required microrelief. The process is controlled by a computer.

EFFECT: improved quality of the microrelief.

4 cl, 3 dwg

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RU 2 248 266 C2

Authors

Kargin N.I.

Jakushev V.M.

Jakushev A.V.

Dates

2005-03-20—Published

2003-01-22—Filed