FIELD: plasma emission electronics, plasma generators, technological gaseous- discharge sources of ribbon beams. SUBSTANCE: gaseous-discharge device is composed of hollow cylindrical cathode 1, two flat cathodes 4, 5 made from magnetic steel and two copper cylindrical anodes 2, 3 arranged uniaxially on both sides of hollow cathode 1. Magnetic system has two permanent ring magnets 6, 7 mounted to form two magnetic fields each including butt of hollow cathode, hollow cathode and permanent ring magnet positioned between them. Butts of hollow cathode, flat cathodes and cylindrical anodes form two symmetrical discharge chambers. Emission hole made in the form of slit is located along hollow cathode. Duct to supply working gas is made in center of hollow cathode. Case of gaseous-discharge device has ducts for forced flow cooling with water. EFFECT: expanded application field. 2 dwg
Title | Year | Author | Number |
---|---|---|---|
WIDE-APERTURE PLASMA EMITTER | 1996 |
|
RU2096857C1 |
VOLUMETRIC GAS-DISCHARGE PLASMA GENERATOR | 2000 |
|
RU2175469C1 |
DEVICE FOR APPLYING COATINGS IN VACUUM | 0 |
|
SU1832134A1 |
WIDE-ANGLE GASEOUS ION SOURCE | 2007 |
|
RU2338294C1 |
DEVICE FOR SURFACE TREATMENT OF METAL AND METAL-CERAMIC ARTICLES | 2019 |
|
RU2725788C1 |
METHOD AND DEVICE FOR MEASURING CURRENT DISTRIBUTION OF RADIALLY CONVERGENT RIBBON ELECTRON BEAMS | 2001 |
|
RU2202116C2 |
PLASMA ION EMITTER DEVICE OF RIBBON TYPE | 1999 |
|
RU2176420C2 |
GAS-DISCHARGE SPUTTERING APPARATUS BASED ON PLANAR MAGNETRON WITH ION SOURCE | 2020 |
|
RU2752334C1 |
METHOD FOR TREATMENT OF SEWAGE AND DEVICE FOR ITS EMBODIMENT | 1993 |
|
RU2057080C1 |
SOURCE OF NEGATIVE IONS | 0 |
|
SU854197A1 |
Authors
Dates
1997-06-27—Published
1994-06-10—Filed