VOLUMETRIC GAS-DISCHARGE PLASMA GENERATOR Russian patent published in 2001 - IPC

FIELD: emissive plasma electronics. SUBSTANCE: device relates to continuous-action plasma ion and electron emitters with large surface area depending for their operation on cold-electrode volumetric discharge and may be used for thermal vacuum treatment in sintering powdered metal parts, soldering, hardening, and also in miscellaneous processes such as degassing parts followed by their activating and coating where combination of electron and ion beams is to be obtained in single cycle by reversing polarity of particle-accelerating voltage. Generator has cathode and anode spaces not spatially separated. It is, essentially, tubular structure with lattice wall of cathode and anode bars. End disk of space and cathode bars mounted on disk periphery function as members of comb-structure hollow cathode. Similar comb structure of anode bars and end lattice electrode is mounted coaxially to cathode structure to form squirrel-cage arrangement without magnetic field together with end and anode electrodes. EFFECT: improved uniformity and density of plasma generated, simplified design, reduced metal input and labor consumption for generator manufacture. 1 cl, 2 dwg