FIELD: methods for removal of contaminating volatile components from contaminated material. SUBSTANCE: method includes placing of contaminated material in gastight space and its washing with inert gas. In this case contaminated material is placed into gastight space kept in metal vessel. Then vacuum is created in gastight space and contaminated material is subjected to induction heating. Washing with inert gas is also carried out in vacuum. According to the first version, prior to washing of material with inert gas, contaminated material is mixed by mixer and, according to the second version, zone of metal vessel free of contaminated material is filled with metal chips. Methods are realized in the device having gastight reactor with at least one loading hole, unit receiving the contaminated material and located in reactor, and source of inert gas made for treatment of contaminated material. Reactor accommodates induction coil and inlet for vacuum pump. Unit receiving contaminated material is made in the form of metal vessel installed in reactor for moving in and out through loading hole. Induction coil is located round metal vessel. In the first version, reactor has mixer heated with heat carrier supplied from outside of reactor. Mixer blades are made for submersion into contaminated material and with holes connected with source of inert gas and possibility of gas discharge through holes. In the second version, reactor accommodates lifting and driving plate carrying on its lower side gas inlets connected with gas source and made for immersion onto surface of metal chips and discharge of gas through holes in branch pipes. EFFECT: higher efficiency. 26 cl, 6 dwg
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Authors
Dates
1997-12-20—Published
1994-05-23—Filed