DEVICE FOR CLEANING SUBSTRATE SURFACE FROM UNWANTED IMPURITIES Russian patent published in 1998 - IPC

Abstract RU 2114486 C1

FIELD: application of high-energy beams for cleaning planar or irregular-shape surfaces of substrates from unwanted impurities. SUBSTANCE: for cleaning surface of substrate 12 located below its molecular crystalline structure, use is made of high-energy radiation source that has pulsed or continuously operated laser 14 or high-energy lamp. EFFECT: provision for removing unwanted surface impurities without changing substrate configuration. 23 cl, 26 dwg , 2 tbl

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RU 2 114 486 C1

Authors

Odri K.Ehngelsberg

Dzhozef A.Dekhajz

Dates

1998-06-27—Published

1993-03-24—Filed