FIELD: methods and devices for removal of contaminants from base surface to be treated with radiation. SUBSTANCE: method includes two stages: introduction of laminar flow of gas over treated surface, with gas neutral relative to treated surface; exposure to radiation of treated surface with high energy whose density and duration of effect being sufficient for removal contaminants from surfaces to be treated by insufficient for changing its crystalline structure. Said gas flow is maintained over treated surface of base under laminar conditions without formation of zones of back flow. Invention also covers device for embodiment of claimed method. EFFECT: high quality removal of contaminants from base surface without changing its molecular crystalline structure or some other disturbance of treated surface and without repeated precipitation of removed particles onto base surface. 29 cl, 43 dwg
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Authors
Dates
1999-09-10—Published
1994-04-11—Filed