METHOD FOR VACUUM PROCESSING OF SMALL-SIZE SINGLE-UNIT GAS-DISCHARGE LASERS Russian patent published in 2000 - IPC

FIELD: quantum electronics. SUBSTANCE: method involves connection of laser to vacuum exhaust cart, its pumping down to high vacuum, checking tightness of pressurized compartment, purification in active gas discharge and checking laser parameters in working gas mix, pumping and heating at maximal temperature, which is afforded by laser design, filling laser with working gas mix and pressurization. Goal of invention is achieved by mounting laser in selective impurity absorber, and heating laser filled with working gas mix under pressure of 13.3-50540 Pa, keeping it for 1-4 hours and repeated pumping down to high vacuum. Filling and pumping-out are repeated at least two times. Upon last pumping-out, method involves measurement of mass spectrum of residual gases. Pumping continues until mass spectrum of residual gases matches reference value, which is mounted at vacuum exhaust cart, when laser is disconnected and vacuum level is at highest level possible for vacuum exhaust cart, but is at least 1.33-4 Pa. EFFECT: increased service life, decreased duration of processing, decreased electric power consumption. 3 cl, 1 dwg