PLASMA ION EMITTER Russian patent published in 2001 - IPC

FIELD: plasma production and generation of large-section ion beams. SUBSTANCE: gas-discharge Penning system for producing homogeneous plasma has hollow anode and end cathodes; one of the latter has emitting window; one of end cathodes is made of ring and central disk whose diameter d meets following condition: d < D - R_L, where D is anode diameter; R_L is Larmor radius for electrons starting from rind surface; voltage U₁ between anode and central disk is lower than voltage U₂ between anode and ring; for different conditions of discharge U₁ = (0.1-0.6)U₂. Gas is injected into anode cavity and applying voltage starts discharge; ions are picked off plasma produced in the process through emitting window. EFFECT: enlarged cross-sectional area of ion beams produced. 1 dwg