RIBBON-TYPE PLASMA ION EMITTER Russian patent published in 2004 - IPC

FIELD: plasma generation and heavy-current ion beam production. SUBSTANCE: emitter has magnetic system and glow-discharge electrode system incorporating rectangular hollow cylindrical cathode one of whose sides is provided with emission holes in the form of slits; cathode accommodates planar anode in its symmetry plane perpendicular to magnetic field induction vector; cathode screens placed at certain potential are installed either side of this anode. Holes are made in central parts of anode and screens. Cumulatively connected solenoids of magnetic system are mounted outside of cathode. Cathode space is filled with gas and electric current is passed through solenoid coils to build up magnetic field in electrode system. Applying voltage produces glow discharge between cathode and anode and its current closes to butt-end surface of anode hole through holes in screens. In the course of discharge glow cathode-emitted electrons drift across magnetic field along emission slits and effectively ionize gas. Cathode space is filled with plasma wherefrom ions are taken through emission slits. EFFECT: enhanced uniformity of plasma toward electron drift affording generation of very long ribbon-type ion beams. 2 cl, 1 dwg