METHOD FOR EVAPORATING FILM ON SUBSTRATE Russian patent published in 2002 - IPC

FIELD: development of new materials and modifying old ones. SUBSTANCE: method involves deposition of coatings on substrate by spraying material being evaporated, its conveying to substrate, and deposition on substrate surface by means of high-frequency fluid plasma generator under dynamic vacuum at pressure p of 0.1 to 100 Pa, flowrate of plasmagenerating gas G of 0 to 0.3 g/s, high- frequency plasma generation frequency f of 1.76 to 18 MHz, and high-frequency discharge power of 0.1 to 4 kW. Proposed method makes it possible to dispense with high-vacuum equipment. EFFECT: enhanced adhesion of films evaporated on substrate. 2 dwg