FIELD: polymer production. SUBSTANCE: invention relates to deposit-suppression agents used in the vinyl chloride and vinyl acetate polymerization processes. Agent represents a product of condensation of an aldehyde, a phenol compound, and an aromatic carboxylic acid substituted by hydroxy group in aromatic nucleus. Agents exist in acidic form or in the form of salts with bases. Composition including above-defined agents and utilized as deposit-suppression agents contain solvent and substances providing adhesion to reactor surface at agent concentration 0.2 to 15% of the weight of solution. Polymerization processes are conducted in reactors with inside walls covered with proposed agents. EFFECT: prevented polymer deposition and enabled preparation of deposit-suppression agents from accessible substances. 11 cl, 11 tbl, 37 ex
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