FIELD: metal-working, chemical, and cement industries. SUBSTANCE: device primarily used for thermal and technological treatment of materials, mainly alumina, has drier, reaction chamber, material cooler, dust catcher, material line, and gas channels. It is provided in addition with gas mixer whose inlet communicates with material cooler and outlet, with drier. Gas channels of reaction chamber and drier are made so that parallel circuits are formed and joined upstream of exhaust fan. Device is also provided with additional dust settling unit disposed downstream of gas mixer and communicating through gas channel with drier and through material line, with material cooler. EFFECT: reduced energy consumption for material treatment. 2 cl, 1 dwg
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Authors
Dates
2003-04-20—Published
2001-06-19—Filed