METHOD AND APPARATUS FOR PLASMA CHEMICAL DEPOSITION OF COATINGS Russian patent published in 2003 - IPC

FIELD: deposition of hardening coatings on cutting tool surfaces. SUBSTANCE: method involves vacuumizing chamber; supplying working gas; exposing solid body target of dispersing material to charged particle beam; providing pulsed supplying of working gas into zone between target and substrate surface. Target is radiated in synchronism with working gas supplying by powerful pulsed charged particle beam with pulse duration of 10-100 nanoseconds and power density of 10⁷-10⁹ W/sq.cm. Apparatus has vacuumizer with target made of dispersing material and holder for article to be coated. Target and holder are positioned in opposed relation to one another. Working gas supply system and charged particle beam source are made in the form of high-current charged particle accelerator having high-voltage vacuum diode positioned in working chamber and inclined with respect to said target. Working gas supply system is of pulsed type. Nozzle is oriented into zone between target and article to be coated. High-current charged particle accelerator and working gas supply system are connected through synchronization unit. Method and apparatus provide initiation of other plasma chemical reactions, including non-equilibrium reactions, and allow charged particle beams of any section, which are not restricted by vacuum resistance diaphragm, to be used. EFFECT: reduced time for deposition of coating and decreased amount of foreign matter in coating material. 5 cl, 2 dwg, 1 ex