ELECTRON-AND-ION SOURCE Russian patent published in 2003 - IPC

FIELD: acceleration engineering; production of electron and ion beams. SUBSTANCE: electron-and-ion source has emitter cathode with emission hole and second cathode opposing first one, anode, drawing system, and power supply system. Novelty characterizing proposed source is that it has two ceramic elements with holes, one of elements being mounted in mouth of hollow cathode and other one, in emitter cathode in vicinity of emission hole; both elements are mounted coaxially with respect to other electrodes. EFFECT: enhanced service life without changing emissive characteristics of source and geometric characteristics of beam. 1 cl, 2 dwg