APPARATUS FOR METERING HOMOGENOUS GAS-VAPOR MIXTURE Russian patent published in 2004 - IPC

FIELD: equipment for making vapor and gas-vapor mixtures used at high-temperature treatment of articles for making semiconductor devices and integrated circuits. SUBSTANCE: apparatus for metering homogenous gas-vapor mixture includes reservoir with reagent, heater arranged in inner tube, temperature control system, evaporation chamber with branch pipes having two tubes eccentrically arranged one inside another and forming slit-type variable cross section capillary gap along said tubes. In capillary gap on lower portion of surface of inner tube along the whole length of said portion there are capillary ducts with sharp roughness of their inner surfaces. EFFECT: enhanced operational reliability of apparatus, possibility for providing reproducible precision parameters of worked articles. 3 dwg